论文成果
Influence of RF bias on the deposition of CrN studied by OES
- 点击次数：
- 论文类型：期刊论文
- 发表时间：2008-07-01
- 发表刊物：European Congress and Exhibition on Advanced Materials and Processes
(Euromat 2007)
- 收录刊物：SCIE、EI、CPCI-S
- 文献类型：J
- 卷号：10
- 期号：7
- 页面范围：628-633
- ISSN号：1438-1656
- 摘要：A study was conducted using optical emission spectroscopy (OES) diagnose system to identify information about the formation of ions and radicals in plasma. The substrate was polarized by RF discharge during DC reactive magnetron sputtering process, while the recorded OES signals near both target and substrate were investigated as a function of RF bias. OES signals show that the main chemical reaction process occurred on substrate surface and the signal ratio can be used to predict the composition evolution. The mutual coupling between magnetron and RF capacity discharge at high RF bias enhanced sputtering Cr flux while reduced the reaction nitrogen on substrate surface. The study results also identifed ion bombardment effects and found that a favorable bias ranging from 60 V to 100 V can make coating dense and improve their mechanical properties.
