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Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating

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Indexed by:期刊论文

Date of Publication:2011-04-15

Journal:APPLIED SURFACE SCIENCE

Included Journals:SCIE、EI

Volume:257

Issue:13

Page Number:5694-5697

ISSN No.:0169-4332

Key Words:Shielded arc ion plating; TiN; Thin films; Deposition rate; Droplet particles; Adhesion

Abstract:Thin films of titanium nitride (TiN) were deposited on stainless steel substrates by a modified deposition technique, double-layered shielded arc ion plating with vicarious circular holes (DL-SAIP). The results show that the TiN film with the distance of 10mm between the double-layered shield plates had the least droplets. The deposition rate of the films prepared with the new technique was more homogeneous than that of all the other shielded arc ion plating. The film/substrate adhesion and microhardness values of the TiN films were higher than 40N and 18 GPa, respectively. Thus such TiN thin films can be expected in applications. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved.

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