Current position: Home >> Scientific Research >> Patents

一种电弧离子镀低温沉高质量装饰薄膜的设备和方法

Release Time:2019-03-09  Hits:

First Author: Lin Guoqiang

Application Number: 2006100457205

Authorization Date: 2006-01-20

Authorization Number: 2006100457205

Prev One:一种微波等离子体炬制备高纯硅粉的方法

Next One:一种提高薄膜沉积质量的电弧离子镀设备
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click:Times MOBILE Version
The Founding Time : ..
The Last Update Time : ..

Mobile phone sweep