Hits:
First Author:zhaohong
Disigner of the Invention:Lin Guoqiang,关少轩,葛振东,Qi Min,yangdazhi
Application Number:CN200910011578.6
Authorization Date:2009-05-13
Authorization number:CN101555597
Pre One:石墨烯改性图形化金属衬底上的氮化镓基薄膜及制备方法
Next One:一种微波等离子体炬制备高纯硅粉的方法