|
个人信息Personal Information
教授
博士生导师
硕士生导师
任职 : 大连理工大学常州研究院院长（2012-2016）
性别：男
毕业院校：大连理工大学
学位：博士
所在单位：材料科学与工程学院
学科：材料物理与化学. 材料表面工程. 等离子体物理
办公地点：三束材料改性教育部重点实验室2号楼（老三束北楼）301室
联系方式：Tel:0411-84708380-8301 Emil:gqlin@dlut.edu.cn
电子邮箱：gqlin@dlut.edu.cn
Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating
点击次数：
论文类型：期刊论文
发表时间：2011-04-15
发表刊物：APPLIED SURFACE SCIENCE
收录刊物：SCIE、EI
卷号：257
期号：13
页面范围：5694-5697
ISSN号：0169-4332
关键字：Shielded arc ion plating; TiN; Thin films; Deposition rate; Droplet particles; Adhesion
摘要：Thin films of titanium nitride (TiN) were deposited on stainless steel substrates by a modified deposition technique, double-layered shielded arc ion plating with vicarious circular holes (DL-SAIP). The results show that the TiN film with the distance of 10mm between the double-layered shield plates had the least droplets. The deposition rate of the films prepared with the new technique was more homogeneous than that of all the other shielded arc ion plating. The film/substrate adhesion and microhardness values of the TiN films were higher than 40N and 18 GPa, respectively. Thus such TiN thin films can be expected in applications. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved.