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Insights into the atomistic behavior in diamond chemical mechanical polishing with OH environment using ReaxFF molecular dynamics simulation

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Date of Publication:2022-10-03

Journal:COMPUTATIONAL MATERIALS SCIENCE

Volume:166

Page Number:136-142

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Gender:Male

Alma Mater:The University of Tokyo

Degree:Doctoral Degree

School/Department:Department of Mechanical Engineering

Discipline:Mechanical Manufacture and Automation

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