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DALIAN UNIVERSITY OF TECHNOLOGY Login 中文
黄火林

Professor
Supervisor of Doctorate Candidates
Supervisor of Master's Candidates


Gender:Male
Alma Mater:厦门大学
Degree:Doctoral Degree
School/Department:光电工程与仪器科学学院
Discipline:Measuring Technology and Instrument. Optical Engineering. Microelectronics and Solid State Electronics
Business Address:大连理工大学 研教楼 724室
E-Mail:hlhuang@dlut.edu.cn
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Current position: Home >> Scientific Research >> Paper Publications

Model Development for Threshold Voltage Stability Dependent on High Temperature Operations in Wide-Bandgap GaN-Based HEMT Power Devices

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Indexed by:期刊论文

Date of Publication:2018-12-01

Journal:MICROMACHINES

Included Journals:SCIE、PubMed、Scopus

Volume:9

Issue:12

ISSN No.:2072-666X

Key Words:threshold voltage (V-th) stability; gallium nitride (GaN); high electron mobility transistors (HEMTs); analytical model; high-temperature operation

Abstract:Temperature-dependent threshold voltage (V-th) stability is a significant issue in the practical application of semi-conductor power devices, especially when they are undergoing a repeated high-temperature operation condition. The V-th analytical model and its stability are dependent on high-temperature operations in wide-bandgap gallium nitride (GaN)-based high electron mobility transistor (HEMT) devices that were investigated in this work. The temperature effects on the physical parameterssuch as barrier height, conduction band, and polarization chargewere analysed to understand the mechanism of V-th stability. The V-th analytical model under high-temperature operation was then proposed and developed to study the measurement temperatures and repeated rounds dependent on V-th stability. The validity of the model was verified by comparing the theoretical calculation data with the experimental measurement and technology computer-aided design (TCAD) simulation results. This work provides an effective theoretical reference on the V-th stability of power devices in practical, high-temperature applications.