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Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates

Paper Publications

[61]刘壮, 桑超峰, 孙继忠, 王德真.EAST中尘埃颗粒行为的数值模拟[A],2013,247-247
[62]黄艳, 桑超峰, 孙继忠, 王德真.EAST偏滤器钨靶板腐蚀的评估[A],2013,74-74
[63]王艳辉, 张瑞丽, 孙继忠, 张建红, 王德真.脉冲介质阻挡放电脱除N_2/NO体系中氮氧化物的模拟研究[A],2013,1
[64]Sang, Chaofeng, Sun, Jizhong, Bonnin, Xavier, Guo, Houyang, Wang, Dezhen, DZ (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, 2 Linggong Rd, Dalian 116024, Peoples R China..Simulation of hydrogen isotope retention in the gap of tungsten divertor tiles[J],20th International Conference on Plasma-Surface Interactions in Controlled Fusion Devices (PSI),2013,438(SUPPL):S1129-S1133
[65]Dai, Shuyu, Kirschner, A., Matveev, D., Borodin, Bjoerkas, C., Sun, Jizhong, Wang, Dezhen, SY (reprint author), Dalian Univ Technol, Minist Educ, Sch Phys & Optoelect Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China..Modelling of local carbon deposition on a rough test limiter exposed to the edge plasma of TEXT...[J],PLASMA PHYSICS AND CONTROLLED FUSION,2013,55(5)
[66]Wang, Qi, Dezhen, Zhang, Jianhong, Liu, Liying, Sun, Jizhong, Q (reprint author), Dalian Univ Technol, Dalian Inst Semicond Technol, Sch Elect Sci & Technol, Dalian 116023, Peoples R China..Improving the homogeneity of alternating current-drive atmospheric pressure dielectric barrier ...[J],PHYSICS OF PLASMAS,2013,20(4)
[67]孙继忠, 王德真.Study of the effects of a transverse magnetic field on radio frequency argon discharges by two-di...[J],Phys. Plasmas,2013,20(11):103507-103515
[68]王艳辉, 孙继忠, 王德真, 张建红.Simulation study of the removal of NO from N2 / NO mixture by pulsed dielectric-barrier discharge...[A],2013
[69]杜海龙, 桑超峰, 王亮, 孙继忠, 刘少承, 汪惠乾, 张凌, 郭后扬, 王德真.EAST高约束模式边界等离子体输运数值模拟研究[J],物理学报,2013,62(24):245206-245210
[70]Zhuang Juan, Sun Jizhong, Sang Chaofeng, Wang Dezhen, Wang, DZ (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Numerical Simulation of VHF Effects on Densities of Important Species for Silicon Film Depositi...[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(12):1106-1109

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