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论文类型：期刊论文
发表时间：2011-08-01
发表刊物：Gongneng Cailiao/Journal of Functional Materials
收录刊物：EI、PKU、ISTIC、Scopus
卷号：42
期号：SUPPL. 4
页面范围：644-647
ISSN号：10019731
摘要：ITO films are deposited on flexible polyimide (PI) substrate by DC magnetron sputtering, and its structural and electrical properties are systematically investigated by X-ray diffraction analysis (XRD), Hall effect measurement (HL) and UV-Vis spectrophotometer. The results indicate that the sputtering power and deposition pressure are the dominant factors influencing the transparent conductive properties of as-grown ITO films on PI substrates, and the effect mechanism of the sputtering power and the deposition pressure are systematically investigated. The high performance ITO transparent conductive film with the visible transparency of 86% and the average resistivity of 3.1    10-4       cm are successfully achieved at the optimized parameters(sputtering power of 100W and deposition presure of 0.4Pa).