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论文类型:期刊论文
发表时间:2014-11-01
发表刊物:MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
收录刊物:SCIE、EI
卷号:27
页面范围:841-845
ISSN号:1369-8001
关键字:Distributed Bragg reflectors; Silicon carbide; Ultraviolet;
Metal-organic chemical vapor deposition
摘要:Crack-free AlGaN/GaN distributed Bragg reflectors (DBRs) for the near-UV region were grown on 6E-SiC substrates by metal-organic chemical vapor deposition (MOCVD). To suppress the generation of cracks, a thin SiNx interlayer was introduced between the first pair of AlGaN/GaN DBR layers. Using this approach, crack-free 30-pair Al0.2Ga0.8N/GaN DBRs were obtained with peak reflectivity of 92.8% at 388 nm and a stop-band bandwidth of 16 nm. Our results reveal that a SiNx interlayer not only decreased the tensile strain but also improved the reflectivity via suppression of cracks. (C) 2014 Elsevier Ltd. All rights reserved.