p-Type Sb-Doped ZnO Thin Films Prepared by Metallorganic Chemical Vapor Deposition Using Metallorganic Dopant
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发布时间:2019-03-10
论文类型:期刊论文
发表时间:2008-01-01
发表刊物:ELECTROCHEMICAL AND SOLID STATE LETTERS
收录刊物:Scopus、EI、SCIE
卷号:11
期号:12
页面范围:H323-H326
ISSN号:1099-0062
摘要:Reproducible p-type Sb-doped ZnO thin films were fabricated on c-plane sapphire substrates by the metallorganic chemical vapor deposition (MOCVD) technique using trimethylantimony as the doping precursor. Sb was introduced into ZnO thin films as a p-type dopant without any phase separation. Obvious donor-acceptor pair emissions were observed from photoluminescence spectra of ZnO:Sb films at 10 K. The acceptor binding energy is estimated to be similar to 124 meV. Using the metallorganic source as the dopant of p-type ZnO thin films by the MOCVD technique is beneficial for the industrialized production of ZnO light-emitting diodes. (C) 2008 The Electrochemical Society. [DOI: 10.1149/1.2980342] All rights reserved.