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论文类型：期刊论文
发表时间：2020-02-01
发表刊物：MATERIALS CHEMISTRY AND PHYSICS
收录刊物：EI、SCIE
卷号：241
ISSN号：0254-0584
关键字：Electrical properties; Microstructure; Multilayered thin film; Sol-gel processes; XPS
摘要：Ferroelectric multilayered thin film structures consisting of Pb-1(.25)(Zr-0(.52),Ti-0(.48))O-3 and Pb-1(.1)(Zr-0.52,Ti-0(.48))O-3 have fabricated on Pt/Ti/SiO2/Si substrates by sol-gel synthesis. The effect of various layer ratios (m/n) of Pb-1(.25)(Zr-0.52,Ti-0(.48))O-3 and Pb-1.1(Zr-0.52,Ti-0(.48))O-3 thin films on the properties of PZT films were investigated. X-ray photoelectron spectroscopy (XPS) reveals that oxygen vacancies were suppressed by altering m/n. Dense perovskite structures were observed by Scanning electron microscope (SEM) analysis. Dielectric properties were enhanced significantly in the multilayered films. Especially, the epsilon(r) reaches 1873 at 1 kHz with a tan delta of 0.082 for the sample with a m/n of 1/3. Moreover, improved ferroelectricity (2P(r) = 36.2 mu C/cm(2), 2E(c) = 78 kV/cm), reduced leakage current density (2.91 x 10(-7) A/cm(2) at 185 kV/cm), and well fatigue resistance were obtained for the film (m/n = 1/3).