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    李涛

    • 副教授     博士生导师   硕士生导师
    • 性别:女
    • 毕业院校:哈尔滨工业大学
    • 学位:博士
    • 所在单位:机械工程学院
    • 学科:机械设计及理论. 工业工程. 机械制造及其自动化
    • 办公地点:机械楼8027室
    • 联系方式:18941330991
    • 电子邮箱:litao@dlut.edu.cn

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    Chemical Reaction Thermodynamic Model of Low Pressure CVD for Nano-TiO2 Film Preparation

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    论文类型:会议论文

    发表时间:2012-01-01

    收录刊物:CPCI-S

    关键字:Low Pressure Chemical Vapor Deposition; Nano-TiO2 film; Thermodynamic model; Energy efficiency

    摘要:With its unique and perfect performance, Nano-TiO2 film has been widely used in many fields. However, the preparation of Nano-TiO2 film has significant sustainability issues including heavy use of energy and materials, low production efficiency, toxic chemical emissions, etc. In this research, case study is conducted on a Low Pressure Chemical Vapor Deposition (LPCVD) process for nano-TiO2 film preparation. For studying chemical reaction energy consumption of LPCVD process, film preparation techniques, chemical engineering thermodynamics and the law of thermodynamics are used to establish parametric thermodynamic model with such thermodynamic metrics as enthalpy change, entropy change and effective energy change. The heat production rate of chemical reaction has been obtained based on reaction rate function and thermodynamic model. Setting certain chemical reaction condition, the corresponding thermodynamic values of Nano-TiO2 film preparation are calculated. At the same time, the energy utilization and material utilization are obtained. To validate the results, the LPCVD process is simulated with Fluent software. The calculated results are compared with the simulation results and are validated. The research can be the basis theory of processes and equipment energy optimization for Nano-TiO2 film preparation.