Indexed by:会议论文
Date of Publication:2018-12-28
Included Journals:EI
Volume:242
Issue:2
Key Words:Argon; Electromagnetic induction; Langmuir probes; Plasma density, Argon plasmas; Axial direction; Gas pressures; Inductively-coupled; Langmuir probe measurements; Plasma potential; Quartz glass; Rf-power, Electron temperature
Abstract:In this paper, a high-density inductively coupled argon plasma was generated by an RF power supply, and the plasma density, electron temperature, and plasma potential were measured by a Langmuir probe. It was found that the plasma density, electron temperature, and plasma potential along the quartz glass tube axial direction increased in the range of 0.37x1019-6.75x1019 m-3, 3.44-5.91 eV, and 11.92-20.09 V respectively, when the incident RF power increased from 3 kV to 8 kV at a gas pressure of 25 Pa. The maximum values of the plasma density and plasma potential appear in the position of coil center and the electron temperature in the coil region almost unchanged. © Published under licence by IOP Publishing Ltd.
Professor
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Gender:Male
Date of Birth:1971-11-24
Alma Mater:Dalian University of Technology
Degree:Doctoral Degree
School/Department:School of Electrical Engineering
Discipline:Theory and New Technology of Electrical Engineering
Business Address:School of Electrical Engineering, Dalian University of Technology, No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, China
Contact Information:dpliu@dlut.edu.cn
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