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论文类型：会议论文

发表时间：2018-12-28

收录刊物：EI

卷号：242

期号：2

关键字：Argon; Electromagnetic induction; Langmuir probes; Plasma density, Argon plasmas; Axial direction; Gas pressures; Inductively-coupled; Langmuir probe measurements; Plasma potential; Quartz glass; Rf-power, Electron temperature

摘要：In this paper, a high-density inductively coupled argon plasma was generated by an RF power supply, and the plasma density, electron temperature, and plasma potential were measured by a Langmuir probe. It was found that the plasma density, electron temperature, and plasma potential along the quartz glass tube axial direction increased in the range of 0.37x1019-6.75x1019 m-3, 3.44-5.91 eV, and 11.92-20.09 V respectively, when the incident RF power increased from 3 kV to 8 kV at a gas pressure of 25 Pa. The maximum values of the plasma density and plasma potential appear in the position of coil center and the electron temperature in the coil region almost unchanged. © Published under licence by IOP Publishing Ltd.