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论文类型：期刊论文

发表时间：2011-05-01

发表刊物：JOURNAL OF CRYSTAL GROWTH

收录刊物：SCIE、EI

卷号：322

期号：1

页面范围：1-5

ISSN号：0022-0248

关键字：Crystal structure; Etching; Chemical vapor deposition processes; Two-step growth; Semiconducting silicon; Solar cells

摘要：A new two-step growth method was proposed to fabricate microcrystalline silicon (mu c-Si:H) thin films by an electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD). An ultra thin Si film was first deposited and followed by H(2) plasma treatment for few minutes, and then the mu c-Si:H film was deposited on it. High-resolution transmission electron microscope (HRTEM) and Raman spectrometer were used to study the microstructures and the crystalline volume fraction of mu c-Si:H films. The HRTEM results show that the amorphous silicon thin film with a thickness of 15 nm can be crystallized by H(2) plasma treatment in 2 min, and then it serves as the seed layer for the subsequent growth of mu c-Si:H films. By optimizing the deposition parameters, the mu c-Si:H film without amorphous incubation layer can be fabricated by this new two-step method and a proper crystalline volume fraction of 50.6% can be obtained. (C) 2011 Elsevier B.V. All rights reserved.