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论文类型：期刊论文

发表时间：2018-01-01

发表刊物：VACUUM

收录刊物：SCIE、EI、Scopus

卷号：147

页面范围：65-71

ISSN号：0042-207X

关键字：Vacuum arc; AMF arc control; Post arc current; Vacuum interrupter

摘要：The paper investigates the influence of the pulsed AMF arc control on the vacuum arc and the post arc characteristic to reveal the mechanism of AMF arc control in different control time and find the proper AMF arc control. The pulsed AMF control system is designed and the pulse width is adjusted from 1.5 ms to 10 ms by changing the capacitors. The test circuit is set up in the synthetic test circuit and the test vacuum interrupter (VI) is transparent in order to observe the development of the vacuum arc by the high speed CMOS camera. The rated voltage and current of the test VI is 10 kV and 25 kA respectively. The post arc current of the test VI is measured in order to analyze the post arc characteristic, such as the post arc charge, post arc conductance and dynamic dielectric strength. The development of vacuum arc and the post arc characteristic influenced by the pulse width, magnitude and control time of the pulsed AMF is obtained, which is useful to special magnetic contacts design. (C) 2017 Elsevier Ltd. All rights reserved.