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论文类型：会议论文

发表时间：2017-01-01

收录刊物：CPCI-S

卷号：2017-December

页面范围：157-160

关键字：vacuum arc; AMF arc control; post arc current; mutli-break VCBs

摘要：The paper investigates the pulsed AMF arc control on the vacuum arc and the post arc characteristic to reveal the mechanism of AMF arc control in different control time and find the proper AMF arc control. The pulsed AMF control system is designed and the pulse width is adjusting from 1.5ms to 10ms. The test circuit is set up in the synthetic test and the test VI is transparency in order to observe the development of the vacuum arc by the high speed CMOS camera. The rated voltage and current of the test VI is 10kV and 25kA respectively. The post arc current of the test VI is measured to analyze the post arc characteristic, such as post arc charge, post arc conductance and dynamic dielectric strength. The developing process of vacuum arc and the post arc characteristic influenced by the pulse width, magnitude and control time of the pulsed AMF is obtained, which is useful to special magnetic contacts design.