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A study on etching properties of quartz and silicon by a dual-frequency (60 MHz/400 kHz) capacitively coupled NF3/Ar/O2 plasma: effect of pressure

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发表时间：2025-10-24

发表刊物：JOURNAL OF PHYSICS D-APPLIED PHYSICS

卷号：58

期号：36

ISSN号：0022-3727

关键字：GAS; MECHANISMS; NF3; SURFACE

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