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论文类型：期刊论文

发表时间：2022-06-30

发表刊物：核技术

所属单位：物理学院

期号：3

页面范围：161-164

ISSN号：0253-3219

摘要：Aluminum films of 3 ��m were deposited on DZ4 alloy by multi-arc ion plating, and were treated by HCPEB (high-current pulse electron beam) at 27 kV in a flux density of 1.5 J/cm2 with the pulse frequency being 1, 5 or 10. SEM images of the samples show that the Al film treated by one pulse became leveled, and the surface smoothness increased with the pulse frequency, but the film treated by 10 pulses had obvious micro crack appearance. Melt pit and eruption phenomenon were observed in the treated films, with the 5-pulse treated being the most obvious. Scanning electron probe microscopy analysis of the film cross-section revealed that the film had been mixed with the substrate. Glancing incidence XRD analysis of the films indicated that, with increasing pulse frequency, the film's Al content reduced, and the Ni content of die substrate increased. The film treated by one pulse had non-crystalline phase, while the multi-pulse processed films had new phase of NiAl, which is advantageous in improving anti-corrosive performance enhancement of the film. An improvement of about 70% was observed in corrosion electric potential test of the 10-pulse irradiated film.

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