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Indexed by:期刊论文

Date of Publication:2012-10-30

Journal:3rd International Conference on Microelectronics and Plasma Technology (ICMAP)

Included Journals:SCIE、EI、CPCI-S、Scopus

Volume:521

Page Number:141-145

ISSN No.:0040-6090

Key Words:Capacitively coupled plasma; Langmuir probe; Optical spectroscopy; Mass spectrometry

Abstract:Capacitively coupled plasma (CCP) is one of the most common industrial plasma sources. Experimental characterization plays key roles in understanding the complex physics involved in CCP, and is based on various probes, optical monitoring and mass spectrometry. Some recent configurations of capacitive discharge like dual frequency CCP, direct current CCP and electric asymmetric CCP have been extensively studied experimentally with these methods. In this paper, we review these recent experimental progresses of CCP studies. (C) 2012 Elsevier B.V. All rights reserved.