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论文类型：期刊论文

发表时间：2009-02-07

发表刊物：JOURNAL OF PHYSICS D-APPLIED PHYSICS

收录刊物：SCIE、EI、Scopus

卷号：42

期号：3

ISSN号：0022-3727

摘要：Surface dielectric barrier discharge (DBD) was used for atmospheric- pressure plasma CVD of TiO2 films from TiCl4 and O-2 for the first time. Under this experiment, the deposition rate was estimated at 22 nm min(-1) by scanning electron microscope observation and the as-deposited TiO2 films were amorphous as evidenced by Raman analysis. The photocatalytic application of TiO2 films in removing HCHO from simulated air was examined in a continuous flow reactor. The TiO2 films after calcination at 350 or 450 degrees C were notably photocatalytically active for complete oxidation of formaldehyde to an innocuous product (CO2), which was consistent with the results of Raman analysis. Using the TiO2 films, an extremely harmful by-product, CO, was not detected from photocatalytic oxidation of HCHO in a simulated air stream.