个人信息Personal Information
教授
博士生导师
硕士生导师
主要任职:无
其他任职:精细化工国家重点实验室副主任、大连理工大学-瑞典皇家工学院分子器件联合研究中心主任
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:化工学院
学科:应用化学. 精细化工
办公地点:大连理工大学西部校区化工实验楼E-223
联系方式:0411-84986493
电子邮箱:sunlc@dlut.edu.cn
Chemical Dopant Engineering in Hole Transport Layers for Efficient Perovskite Solar Cells: Insight into the Interfacial Recombination
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论文类型:期刊论文
发表时间:2018-10-01
发表刊物:ACS NANO
收录刊物:SCIE
卷号:12
期号:10
页面范围:10452-10462
ISSN号:1936-0851
关键字:chemical dopants; hole transport materials; perovskite solar cells; interfacial recombination; passivation; Al2O3
摘要:Chemical doping of organic semiconductors has been recognized as an effective way to enhance the electrical conductivity. In perovskite solar cells (PSCs), various types of dopants have been developed for organic hole transport materials (HTMs); however, the knowledge of the basic requirements for being efficient dopants as well as the comprehensive roles of the dopants in PSCs has not been clearly revealed. Here, three copper-based complexes with controlled redox activities are applied as dopants in PSCs, and it is found that the oxidative reactivity of dopants presents substantial impacts on conductivity, charge dynamics, and solar cell performance. A significant improvement of open- circuit voltage (V-oc) by more than 100 mV and an increase of power conversion efficiency from 13.2 to 19.3% have been achieved by tuning the doping level of the HTM. The observed large variation of V-oc for three dopants reveals their different recombination kinetics at the perovskite/HTM interfaces and suggests a model of an interfacial recombination mechanism. We also suggest that the dopants in HTMs can also affect the charge recombination kinetics as well as the solar cell performance. Based on these findings, a strategy is proposed to physically passivate the electron- hole recombination by inserting an ultrathin Al2O3 insulating layer between the perovskite and the HTM. This strategy contributes a significant enhancement of the power conversion efficiency and environmental stability, indicating that dopant engineering is one crucial way to further improve the performance of PSCs.