孙立成

个人信息Personal Information

教授

博士生导师

硕士生导师

主要任职:无

其他任职:精细化工国家重点实验室副主任、大连理工大学-瑞典皇家工学院分子器件联合研究中心主任

性别:男

毕业院校:大连理工大学

学位:博士

所在单位:化工学院

学科:应用化学. 精细化工

办公地点:大连理工大学西部校区化工实验楼E-223

联系方式:0411-84986493

电子邮箱:sunlc@dlut.edu.cn

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Efficient BiVO4 Photoanodes by Postsynthetic Treatment: Remarkable Improvements in Photoelectrochemical Performance from Facile Borate Modification

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论文类型:期刊论文

发表时间:2019-12-19

发表刊物:ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

收录刊物:EI、SCIE

卷号:58

期号:52

页面范围:19027-19033

ISSN号:1433-7851

关键字:artificial photosynthesis; BiVO4; borate; photoelectrochemical cells; water oxidation

摘要:Water-splitting photoanodes based on semiconductor materials typically require a dopant in the structure and co-catalysts on the surface to overcome the problems of charge recombination and high catalytic barrier. Unlike these conventional strategies, a simple treatment is reported that involves soaking a sample of pristine BiVO4 in a borate buffer solution. This modifies the catalytic local environment of BiVO4 by the introduction of a borate moiety at the molecular level. The self-anchored borate plays the role of a passivator in reducing the surface charge recombination as well as that of a ligand in modifying the catalytic site to facilitate faster water oxidation. The modified BiVO4 photoanode, without typical doping or catalyst modification, achieved a photocurrent density of 3.5 mA cm(-2) at 1.23 V and a cathodically shifted onset potential of 250 mV. This work provides an extremely simple method to improve the intrinsic photoelectrochemical performance of BiVO4 photoanodes.