点击次数：

发表时间：2022-10-09

发表刊物：中国表面工程

所属单位：材料科学与工程学院

卷号：25

期号：5

页面范围：15-20

ISSN号：1007-9289

摘要：High power pulsed magnetron sputtering (HPPMS) is pulsed sputtering
   where the peak power exceeds the time-averaged power by two orders of
   magnitude and a very significant fraction of the sputtered atoms becomes
   ionized. As a new developing ionized physical vapor deposition, HPPMS
   has received extensive interest from researchers and led to a
   substantial increase of the publications related to the high power
   pulsed discharge, the plasma characteristic, and the films and their
   process. This paper describes the definition and the basic principle of
   HPPMS and reviews the recent advance in the high power pulsed power
   supply, the plasma characteristics and discharge physics, the plasma
   model and deposition rate, and the thin film properties for HPPMS.

备注：新增回溯数据