个人信息Personal Information
教授
博士生导师
硕士生导师
任职 : 《Plasma Science and Technology》学术期刊编委
性别:男
毕业院校:大连工学院
学位:硕士
所在单位:物理学院
学科:等离子体物理
办公地点:主楼东侧楼(物理系楼)304室
联系方式:0411-84707981
电子邮箱:wangdez@dlut.edu.cn
Modeling of high frequency atmospheric pressure Ar/H-2/SiH4 glow discharges
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论文类型:期刊论文
发表时间:2011-08-01
发表刊物:Joint Meeting of the 10th Asia-Pacific Conference on Plasma Science and Technology (APCPST 2010)/153rd Symposium on Plasma Science for Materials (SPSM 2010)
收录刊物:SCIE、EI、CPCI-S、Scopus
卷号:519
期号:20,SI
页面范围:7014-7019
ISSN号:0040-6090
关键字:Plasma; Numerical simulation; Atmospheric pressure; Mode
摘要:In this paper, a one-dimensional self-consistent fluid model is applied to simulate high frequency atmospheric pressure glow discharges. The results show that the plasma density and current density depend strongly on the excitation frequency. When the excitation frequency is below 13.56 MHz, the discharge operates in the a mode, and when the excitation frequency is above 13.56 MHz, the discharge operates in a gamma-like mode. The densities of species including SiH3+, SiH3-,SiH3, SiH2, H, Ar+ Ar* and electron are enhanced with the frequency increasing from 6.78 to 27.12 MHz. Similar discharge mode transition was observed experimentally in radio frequency atmospheric pressure He glow discharges. The effects of excitation frequency on plasma characteristics and densities of precursors for pc-Si:H film are further discussed. This study reveals that an appropriate excitation frequency is important for the growth of pc-Si:H film. (C) 2011 Elsevier B.V. All rights reserved.