个人信息Personal Information
教授
博士生导师
硕士生导师
任职 : 《Plasma Science and Technology》学术期刊编委
性别:男
毕业院校:大连工学院
学位:硕士
所在单位:物理学院
学科:等离子体物理
办公地点:主楼东侧楼(物理系楼)304室
联系方式:0411-84707981
电子邮箱:wangdez@dlut.edu.cn
Numerical study of He/CF3I pulsed discharge used to produce iodine atom in chemical oxygen-iodine laser
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论文类型:期刊论文
发表时间:2013-04-01
发表刊物:PHYSICS OF PLASMAS
收录刊物:SCIE、EI、Scopus
卷号:20
期号:4
ISSN号:1070-664X
摘要:The pulsed discharge for producing iodine atoms from the alkyl and perfluoroalky iodides (CH3I, CF3I, etc.) is the most efficient method for achieving the pulse operating mode of a chemical oxygen-iodine laser. In this paper, a one-dimensional fluid model is developed to study the characteristics of pulsed discharge in CF3I-He mixture. By solving continuity equation, momentum equation, Poisson equation, Boltzmann equation, and an electric circuit equation, the temporal evolution of discharge current density and various discharge products, especially the atomic iodine, are investigated. The dependence of iodine atom density on discharge parameters is also studied. The results show that iodine atom density increases with the pulsed width and pulsed voltage amplitude. The mixture ratio of CF3I and helium plays a more significant role in iodine atom production. For a constant voltage amplitude, there exists an optimal mixture ratio under which the maximum iodine atom concentration is achieved. The bigger the applied voltage amplitude is, the higher partial pressure of CF3I is needed to obtain the maximum iodine atom concentration. (C) 2013 AIP Publishing LLC [http://dx.doi.org/10.1063/1.4802032]
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