个人信息Personal Information
教授
博士生导师
硕士生导师
任职 : 《Plasma Science and Technology》学术期刊编委
性别:男
毕业院校:大连工学院
学位:硕士
所在单位:物理学院
学科:等离子体物理
办公地点:主楼东侧楼(物理系楼)304室
联系方式:0411-84707981
电子邮箱:wangdez@dlut.edu.cn
Non-Uniformity of Ion Implantation in Direct-Current Plasma Immersion Ion Implantation
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论文类型:期刊论文
发表时间:2010-07-01
发表刊物:CHINESE PHYSICS LETTERS
收录刊物:SCIE、ISTIC
卷号:27
期号:7
ISSN号:0256-307X
摘要:A particle-in-cell simulation is developed to study dc plasma immersion ion implantation. Particular attention is paid to the influence of the voltage applied to the target on the ion path, and the ion flux distribution on the target surface. It is found that the potential near the aperture within the plasma region is not the plasma potential, and is impacted by the voltage applied to the implanted target. A curved equipotential contour expands into the plasma region through the aperture and the extent of the expansion depends on the voltage. Ions accelerated by the electric field in the sheath form a beam shape and a flux distribution on the target surface, which are strongly dependent on the applied voltage. The results of the simulations demonstrate the formation mechanism of the grid-shadow effect, which is in agreement with the result observed experimentally.