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发布时间：2019-03-09

论文类型：期刊论文

发表时间：2016-01-01

发表刊物：OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS

收录刊物：Scopus、SCIE

卷号：10

期号：1-2

页面范围：123-126

ISSN号：1842-6573

关键字：Electro deposition; Chromium; Crack; Metallograph; Grain growth

摘要：Homogeneous, crystallized and crack-free chromium (Cr) coating was electrodeposited on stainless steel at 85 degrees C with a current density of 80 A/dm(2), evidenced by the surface and cross section metallographs of the coating. X-ray diffraction analyses indicate the coating is largely composed of body centred cubic alpha-Cr. The effect of temperature on the generation of cracks, surface hardness and cathodic current efficiency were also investigated. The reduction in crack density with increasing temperature may be interpreted in terms of the decreasing inhibition of lateral grain growth.