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论文类型：期刊论文

发表时间：2013-08-01

发表刊物：PLASMA PROCESSES AND POLYMERS

收录刊物：SCIE、EI、Scopus

卷号：10

期号：8

页面范围：698-705

ISSN号：1612-8850

关键字：atmospheric-pressure; cold plasma; homogeneous; inactivation application; resistant fungi cell

摘要：A surface discharge device composed of microns-thick hollow quartz fibers is used to inactivate resistant fungi cells. The homogeneous cold plasmas are generated by using a pulse high-voltage source with the repetition frequency of 150 Hz at atmospheric-pressure. Increasing pulse voltage slightly from 26 to 34 kV leads to an obvious improvement in the inactivation efficiency of fungi cells. The atmospheric-pressure air plasma generated at the pulse voltage of 34kV is found to kill the fungi cells as much as 99% within a treatment time of 5min. The inactivation efficiency is systematically investigated as a function of the processing depth of surface plasma. Various measurements indicate that plasma activated derivatives, such as OH, O, O-3, and charged species play a key role in this plasma inactivation process.