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邻位取代苝酰亚胺衍生物的合成及其电子迁移率
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Indexed by:期刊论文

Date of Publication:2014-01-15

Journal:精细化工

Included Journals:PKU、ISTIC、CSCD

Volume:31

Issue:1

Page Number:25-30,58

ISSN No.:1003-5214

Key Words:苝酰亚胺;邻位取代;光谱性质;电化学性质;热稳定性;电子迁移率;功能材料

Abstract:以N,N'-二(3-戊胺)苝酰亚胺为底物,分别经过Ir催化剂直接催化邻位C-H的硼酸酯化和取代反应得到了2,5,8,11位含氯和含溴的苝酰亚胺衍生物Ⅲ和Ⅳ,利用1HNMR、13 CNMR和HRMS对产物进行了表征.通过在苝酰亚胺的邻位引入卤原子后,相对于化合物Ⅰ,化合物Ⅲ和Ⅳ吸收光谱和荧光光谱均发生了蓝移;LUMO能级明显降低,分别为-4.18 eV和-4.16 eV.邻位引入卤原子后化合物Ⅲ和Ⅳ仍然具有良好的热稳定性,其失重5%时的温度(Td)均大于370℃.利用空间电荷限制电流(SCLC)法测试了它们的电子迁移率,发现卤原子的引入使分子间排列更加有序,其中化合物Ⅲ的迁移率最高,可以达到3.05×10-4 cm2·V-1·s-1.

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Alma Mater:Dalian University of Technology

Degree:Doctoral Degree

School/Department:State Key Laboratroy of Fine Chemicals

Discipline:Applied Chemistry. Fine Chemicals. Biochemical Engineering

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