大连理工大学主页平台管理系统刘新--中文主页--论文成果

扫描手机二维码

欢迎您的访问
您是第位访客

开通时间：..

最后更新时间：..

大连理工大学| 登录| English | 手机版

同专业博导

同专业硕导

个人学术主页

刘新 ( 副教授 ) 赞
的个人主页 http://faculty.dlut.edu.cn/xliu/en/index.htm
副教授博士生导师硕士生导师

论文成果当前位置: 中文主页 >> 科学研究 >> 论文成果

[136]Liu, Xin, Guo, Huimin, Meng, Changgong.COMP 139-CCl4 adsorption and dissociation on Si(111)- root 3x root 3-Ag surface from first prin...[J],ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY,2008,235
[137]Liu, X., Meng, C., Guo, H..First principles study on CCl4 dissociation on Ag(111) surface[A],2008
[138]Liu, X., Guo, H., Meng, C..DFT study for CCl4 adsorption on Ag(111) surface[A],2008
[139]刘新.Why is the size dependence of the scanning tunneling microscopy workfunction order of macnitude l...[A],2008
[140]刘新.Unique reactivity of confined metal atoms on silicon substrate[A],2008
[141]刘新, 郭新闻.Theoretical Study on Conversion of Sugars to 5-Hydroxymethyfurfural in Acidic Media[A],2008,5:68-68
[142]郭慧敏, 刘新.Potentiometric Measurement of Ascorbate by Using a Solvent Polymeric Membrane Electrode[A],2008,2:51-51
[143]刘新, 郭慧敏, 孟长功.Cl adsorption on Si(111)-√3x√3- Ag surface from first principles[A],2008
[144]刘新, 郭慧敏, 孟长功.CCl4 adsorption and dissociation on Si(111)- √3x√3- Ag surface from first principles[A],2008
[145]刘新, 郭慧敏.Tuning surface reactivity via quantum size effect[A],2008
[146]刘新, 郭慧敏, 孟长功.Electronic structure of the Si(111)-√ 3 x√ 3- Ag surface[A],2008
[147]郭慧敏, 刘新.A novel potentiometric method by using a polymeric membrane electrode[A],2008
[148]刘新, 郭慧敏, 孟长功.Unique Reactivity of Confined Metal Overlayer on Si(111)[A],2008,3:416-416
[149]郭慧敏, 刘新, 孟长功.Wavevector-dependent Quantum-size Effect in Electron Decay Length at Pb Thin Film Surface[A],2008,3:62-62
[150]刘新, 孟长功, 刘长厚, Meng, CG (reprint author), Dalian Univ Technol, Dept Chem, Dalian 116024, Peoples R China..O2在NiTi合金(100)表面吸附的理论研究[J],金属学报,2006,42(4):421-425

共162条 10/11

首页上页下页尾页页

辽ICP备05001357号地址：中国·辽宁省大连市甘井子区凌工路2号邮编：116024
版权所有：大连理工大学