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论文类型：期刊论文

发表时间：2016-05-01

发表刊物：MATERIALS RESEARCH BULLETIN

收录刊物：SCIE、EI

卷号：77

页面范围：199-204

ISSN号：0025-5408

关键字：Nitrides; Oxide; Thin films; Sputtering; Electrical properties

摘要：The nitride-oxide based p-n heterojunctions with the n-VO2/p-GaN/sapphire structure was realized by sputtering deposition of VO2 films on p-GaN/sapphire substrates. The structure and electrical properties of the as-grown VO2/p-GaN/sapphire heterostructure were investigated systematically. The distinct reversible semiconductor-to-metal transition (SMT) with resistance change up to nearly two orders of magnitude was observed for the sample deposited at the optimized conditions. Moreover, the clear rectifying current-voltage characteristics originated from the n-VO2/p-GaN interface were demonstrated both before and after SMT of VO2 over layer, which were attributed to the p-n junction behavior and Schottky contact character, respectively. Our present finding demonstrated the feasibility of integrating correlated oxide and wide bandgap nitride semiconductors, and will further motivate research in novel devices with combined functional properties of both kinds of materials. (C) 2016 Elsevier Ltd. All rights reserved.