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工程师

性别:男

毕业院校:大连理工大学

学位:博士

所在单位:集成电路学院

学科:微电子学与固体电子学

办公地点:开发区校区教学楼C区505

联系方式:0411-62273207

电子邮箱:ymluo@dlut.edu.cn

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Stress State of GaN Epilayer Grown on Sapphire and 6H-SiC Substrates

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论文类型:期刊论文

发表时间:2013-09-01

发表刊物:JOURNAL OF TESTING AND EVALUATION

收录刊物:SCIE、Scopus

卷号:41

期号:5

页面范围:798-803

ISSN号:0090-3973

关键字:GaN; metalorganic chemical vapor deposition; stress state; dislocations

摘要:The stress states and influence of two opposite stress types under similar stress intensities on the structural and optical properties of GaN films grown on sapphire and 6H-SiC substrates via metalorganic chemical vapor deposition were investigated. The E-2 (high) phonon shifts of Raman spectra show that tensile stresses exist in the GaN epilayer grown on 6H-SiC, whereas compressive stresses appear in the film grown on sapphire, indicating that the thermal mismatch between the epilayers and the substrates plays a major role in determining the residual stresses in GaN films. Narrower full widths at half-maximum of E2 (high) phonon and double crystal X-ray diffraction peaks and the higher E2 (high) phonon intensity are visible for the GaN film grown on sapphire, illustrating that under almost equivalent stress intensities, tensile stresses have a much more negative influence on the crystalline quality of GaN epilayers. Finally, a numerical relationship between the luminescent band gap and the biaxial stresses of the GaN films is obtained at 10 K.