大连理工大学主页平台管理系统 YongXin Liu--yxliu-- Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude

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Striations in dual-frequency capacitively coupled CF4 plasmas: the role of the high-frequency voltage amplitude

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Date of Publication:2022-10-08

Journal:PLASMA SOURCES SCIENCE TECHNOLOGY

Affiliation of Author(s):物理学院

Volume:28

Issue:7

ISSN No.:0963-0252

Pre One:Suppression of nonlinear standing wave excitation via the electrical asymmetry effect

Next One:Striations in electronegative capacitively coupled radio-frequency plasmas: analysis of the pattern formation and the effect of the driving frequency

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Gender:Male

Alma Mater:大连理工大学

Degree:Doctoral Degree

School/Department:物理学院

Discipline:Plasma physics

Business Address:大连理工大学三束材料改性教育部重点实验室3号楼201室

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