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发表时间：2022-10-10

发表刊物：大连理工大学学报

期号：3

页面范围：275-278

ISSN号：1000-8608

摘要：The DC discharge of a planar magnetron was enhanced by twinned microwave electron cyclotron resonance plasma source. The magnetic cusp geometry formed in the processing chamber was used for plasma confinement. The sputtering discharge characteristics were investigated and a combined mode of voltage and current was observed at pressure as low as 0.007 Pa. Carbon nitride thin films were synthesized using this method. Characterization of the films shows that the films were composed of a single amorphous carbon nitride phase with N C atom number ratio close to that of C3N4, and the bonding was mainly of C-N type.

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