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个人信息Personal Information
教授
硕士生导师
任职 : 三束实验室常务副主任
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:物理学院
学科:等离子体物理. 物理化学
办公地点:新三束实验室4号楼406
联系方式:办公电话 84709795-18
电子邮箱:zhangjl@dlut.edu.cn
Atmospheric Pressure Plasma Jet in Ar and O-2/Ar Mixtures: Properties and High Performance for Surface Cleaning
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论文类型:期刊论文
发表时间:2013-12-01
发表刊物:PLASMA SCIENCE & TECHNOLOGY
收录刊物:EI、SCIE、Scopus
卷号:15
期号:12
页面范围:1203-1208
ISSN号:1009-0630
关键字:atmospheric pressure plasma jet; surface cleaning; the excitation temperature; the contact angle; quadrupole mass-spectrum
摘要:An atmospheric pressure plasma jet generated in Ar and O-2/Ar mixtures has been investigated by specially designed equipment with double power electrodes at 20 similar to 32 kHz, and their effects on the cleaning of surfaces have been studied. Properties of the jet discharge are studied by electrical diagnostics, including the waveform of discharge voltage, discharge current and the Q-V Lissajous figures. The optical emission spectroscopy is used to measure the plasma parameters, such as the excitation temperature and the gas temperature. It is found that the consumed power and the excitation temperature increase with increase of the discharge frequency. On the other hand, at the same discharge frequency, these parameters in O-2/Ar mixture plasma are found to be much larger. The effect on surface cleaning is studied from the changes in the contact angle. For Ar plasma jet, the contact angle decreases with increase of the discharge frequency. For O-2/Ar mixture plasma jet, the contact angle decreases with increase of discharge frequency up to 26 kHz, however, further increase of discharge frequency does not show further decrease in the contact angle. At the same discharge frequency, the contact angle after O-2/Ar mixture plasma cleaning is found to be much lower compared to the case of pure Ar. From the results of quadrupole mass-spectrum analysis, we can identify more fragment molecules of CO and H2O in the emitted gases after O-2/Ar plasma jet treatment compared with Ar plasma jet treatment, which are produced by the decomposition of surface organic contaminants during the cleaning process.