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论文类型：期刊论文

发表时间：2020-02-01

发表刊物：PLASMA SOURCES SCIENCE & TECHNOLOGY

收录刊物：SCIE

卷号：29

期号：2

ISSN号：0963-0252

关键字：DC; RF CCP; PIC; MCC; secondary electron emission

摘要：Particle-in-cell/Monte Carlo collision simulations are performed to investigate the effects of using realistic models for secondary electron emission induced by different plasma species on the discharge characteristics in direct current (DC) superposed radio-frequency (RF) capacitively coupled plasmas (CCPs). A dual-frequency (DF, 60/2 MHz) source is applied on one of the electrodes to sustain the discharge, and an auxiliary DC source is fixed on the opposite electrode to generate energetic secondary electrons (SEs). Realistic models are employed to calculate the secondary electron yields (SEYs) induced by electrons and heavy particles (i.e. ions and fast neutrals) impacting the 'dirty' surfaces (e.g. oxidized metal), respectively, in argon discharge at a fixed pressure of 1.5 Pa. The results are compared to those obtained by assuming a constant ion-induced SEYs of gamma = 0.1, and a constant elastic reflected electron yield of eta(el.) = 0.2. As the effective SEY gamma* (arising from heavy particle impact) calculated from the realistic model is enhanced at the DC electrode, numerous gamma-electrons can be induced under the effect of the DC-bias. These gamma-electrons then bombard the opposite RF electrode with mean energies corresponding to the value of DC-bias, which further induce significant emission of delta-electrons (i.e. electron-induced SEs). Moreover, the delta-electrons originating from the RF electrode can be trapped and bounced back by the opposite DC sheath toward the RF electrode, inducing delta-electron emission once more. Consequently, this positive-feedback source of delta-electrons, leads to an enhanced ionization in the first half-cycle of the low frequency period, and a further growth in plasma density in hybrid DC/RF discharge.