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论文类型： 期刊论文

发表时间： 2009-12-15

发表刊物： SURFACE & COATINGS TECHNOLOGY

收录刊物： SCIE、EI、Scopus

卷号： 204

期号： 5

页面范围： 713-717

ISSN号： 0257-8972

关键字： Magnetron sputtering; Bond content; BCN

摘要： Using radio frequency reactive magnetron sputtering technique with boron and graphite targets, amorphous B-C-N films were synthesized on the silicon (100) substrate applied with different temperatures and bias voltages. The structural and bonding characteristics of the synthesized films were characterized by Fourier transform infrared spectroscopy (FTIR) and X-ray phortoelectron spectroscopy (XPS). The bond contents in the B-C-N films show remarkable dependence on the bias voltage applied to the substrate at 400 degrees C. (C) 2009 Elsevier B.V. All rights reserved.