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双放电腔微波-ECR等离子体源增强磁控溅射沉积技术

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Date of Publication:2022-10-10

Journal:大连理工大学学报

Issue:3

Page Number:275-278

ISSN No.:1000-8608

Abstract:The DC discharge of a planar magnetron was enhanced by twinned microwave electron cyclotron resonance plasma source. The magnetic cusp geometry formed in the processing chamber was used for plasma confinement. The sputtering discharge characteristics were investigated and a combined mode of voltage and current was observed at pressure as low as 0.007 Pa. Carbon nitride thin films were synthesized using this method. Characterization of the films shows that the films were composed of a single amorphous carbon nitride phase with N C atom number ratio close to that of C3N4, and the bonding was mainly of C-N type.

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