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Date of Publication:2022-10-09

Journal:电加工与模具

Affiliation of Author(s):机械工程学院

Issue:2

Page Number:29-32,37

ISSN No.:1009-279X

Abstract:The mask film for the micro pit array was manufactured by using negative photoresist lithography process,then experiments were made to analyze the effect of the polishing process on uniformity of the etching,so as to ultimately solve the problem of the etching defect. The influence of the pickling on the substrate was studied ,it was found that pickling can improve the etching uniformity,then precipitation problem was solved by adjusting the pH of the solution. The influence of the mask aperture on the electrochemical etching was analyzed. The micro pit array with the diameter of 60 μm and depth of 11 μm was fabricated by the self-established electrochemical etching equipment. The results verify the feasibility of the mask electrochemical etching ,which means that the proposed process can provide a referenced scheme for the production of micropattern on the metal surface.

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