谭毅Yi Tan

(教授)

 博士生导师  硕士生导师
学位:博士
性别:男
毕业院校:东京工业大学
所在单位:材料科学与工程学院
电子邮箱:tanyi@dlut.edu.cn

论文成果

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THE CONTINUOUS GROWTH OF BULK Si BY TEMPERATURE GRADIENT ZONE MELTING METHOD

发表时间:2019-07-01 点击次数:

论文名称:THE CONTINUOUS GROWTH OF BULK Si BY TEMPERATURE GRADIENT ZONE MELTING METHOD
论文类型:期刊论文
发表刊物:ARCHIVES OF METALLURGY AND MATERIALS
收录刊物:SCIE、EI
卷号:64
期号:1
页面范围:271-278
ISSN号:1733-3490
关键字:Bulk Si; TGZM; Si-Al alloy; Growth rate; Impurities
摘要:Temperature gradient zone melting (TGZM) method was used to obtain bulk Si continuously for the efficient separation and purification of primary Si from the Si-Al alloy in this work. The effects of alloy thickness, temperature gradient and holding time in TGZM purification technology were investigated. Finally, the continuous growth of bulk Si without eutectic inclusions was obtained. The results showed that the growth rate of bulk Si was independent of the liquid zone thickness. When the temperature gradient was changed from 2.48 K/mm to 3.97 K/mm, the growth rate of bulk Si was enhanced from 7.9x10(-5) mm/s to 2.47x10(-4) mm/s, which was increased by about 3 times. The bulk Si could grow continuously and the growth rate was decreased with the increase of holding time from 1 h to 5 h. Meanwhile, low refilling temperature was beneficial to the removal of impurities. With a precipitation temperature of 1460 K and a temperature gradient of 2.48 K/mm, the removal rates of Fe, P and B were 99.8%, 94.0% and 63.6%, respectively.
发表时间:2019-01-01