刘峰

Engineer  

Gender:Male

Alma Mater:吉林大学

Degree:Doctoral Degree

School/Department:化工海洋与生命学院

Discipline:Polymer Chemistry and Physics

Business Address:D04-110

Contact Information:0427-2631844

E-Mail:liufeng@dlut.edu.cn


Paper Publications

Effect of annealing protection atmosphere on the ferroelectric yttrium doped hafnium oxide thin films

Hits:

Date of Publication:2022-10-02

Journal:CERAMICS INTERNATIONAL

Volume:46

Issue:14

Page Number:22550-22556

ISSN No.:0272-8842

Pre One:DC substrate bias enables preparation of superior-performance TiN electrode films over a wide process window

Next One:Ferroelectric properties of pure ZrO2 thin films by chemical solution deposition