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论文类型：期刊论文

发表时间：2013-12-01

发表刊物：PHYSICS OF PLASMAS

收录刊物：SCIE、EI、Scopus

卷号：20

期号：12

ISSN号：1070-664X

摘要：The E to H mode transitions are studied by a hairpin probe and optical emission spectroscopy in inductively coupled CF4+Ar plasmas. Electron density, optical emission intensity of Ar, and the voltage and current are measured during the E to H mode transitions. It is found that the electron density and plasma emission intensity increase continuously at low pressure during the E to H mode transition, while they jump up discontinuously at high pressure. Meanwhile, the transition threshold power and Delta P (the power interval between E and H mode) increase by increasing the pressure. When the ratio of CF4 increases, the E to H mode transition happens at higher applied power, and meanwhile, the Delta P also significantly increases. Besides, the effects of CF4 gas ratio on the plasma properties and the circuit electrical properties in both pure E and H modes were also investigated. The electron density and plasma emission intensity both decrease upon increasing the ratio of CF4 at the two modes, due to the stronger electrons loss scheme. The applied voltages at E and H modes both increase as increasing the CF4 gas ratio, however the applied current at two modes behave just oppositely with the gas ratio. (C) 2013 AIP Publishing LLC.