Hits:

Indexed by:期刊论文

Date of Publication:2018-12-01

Journal:OPTICAL FIBER TECHNOLOGY

Included Journals:SCIE、Scopus

Volume:46

Page Number:137-140

ISSN No.:1068-5200

Key Words:Fiber-optic connectors; Damage layer; Connection loss; Chemical polishing

Abstract:The damage layer, located at the endface of the fiber-optic connector, is currently the main intrinsic parameter that ultimately limits the connector's ability to achieve the lowest reflectance at the connection point. It deteriorates the connector's return loss and insertion loss and cannot be eliminated by mechanical method. We propose a method called chemical polishing, which is low cost and easy to operate, to eliminate the damage layer. Both theoretical and experimental work have been conducted to reveal the influence mechanism of the damage layer on the return loss and insertion loss. The results show that, by etching the damage layer in a low concentration (<= 6%) hydrofluoric acid solution with a short etching time (<= 40 s), we can effectively eliminate the damage layer and increase return loss without deteriorating the surface quality.