Current position: Home >> Scientific Research >> Paper Publications

Plasma source ion implantation (PSII) and PSII enhanced film deposition

Release Time:2019-03-12  Hits:

Indexed by: Journal Article

Date of Publication: 1993-01-01

Journal: Chinese Physics Letters

Included Journals: CSCD

Volume: 10

Issue: 增刊

Page Number: 355

ISSN: 0256-307X

Key Words: 离子注入; 等离子体源; 薄膜; 淀积

Prev One:氩气直流辉光放电阴极区电子群的蒙特卡罗模拟

Next One:氩辉光放电阴极区离子的能量和角分布