Hits:

Indexed by:期刊论文

Date of Publication:1999-04-15

Journal:JOURNAL OF APPLIED PHYSICS

Included Journals:Scopus、SCIE

Volume:85

Issue:8

Page Number:3949-3951

ISSN No.:0021-8979

Abstract:A theoretical model is developed to study the velocity distributions of neutrals striking a planar target in plasma source ion implantation (PSII) for the case in which the pressure of the gas is large enough that the fast neutrals can be produced in the sheath by ion-neutral charge exchange collisions. An analytic expression for the neutral velocity distribution at the target is provided. The theoretic results agree with Monte Carlo simulations. (C) 1999 American Institute of Physics. [S0021-8979(99)03008-X].