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Indexed by:期刊论文

Date of Publication:1993-08-15

Journal:JOURNAL OF APPLIED PHYSICS

Included Journals:SCIE、Scopus

Volume:74

Issue:4

Page Number:2986-2988

ISSN No.:0021-8979

Abstract:A model is developed to study the temporal evolution of the sheath during a pulse of high negative voltage applied to a target immersed in a plasma, such as that present in plasma source ion implantation. This model covers the whole range from collision free to collision dominated sheaths. The sheath expansion velocity and the position of the sheath edge as a function of time in planar geometries for various pressures are obtained.