Simulation of ion behavior in a photoresist trench during metal etching driven by a radio-frequency source
Release Time:2019-03-12 Hits:
Indexed by: Conference Paper
Date of Publication: 2010-01-01
Page Number: 648-648
Release Time:2019-03-12 Hits:
Indexed by: Conference Paper
Date of Publication: 2010-01-01
Page Number: 648-648