Hits:
Indexed by:期刊论文
Date of Publication:2013-01-01
Journal:Phys. Plasmas
Volume:20
Issue:10
Page Number:102121-102121
Pre One:Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma
Next One:Anti-irradiation performance against helium bombardment in bulk metallic glass (Cu 47 Zr 45 Al 8 ) 98.5 Y 1.5